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Biometrika 1993 80(1):203-209; doi:10.1093/biomet/80.1.203
© 1993 by Biometrika Trust
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Minimum aberration designs with two-level and four-level-factors

C. F. J. WU1 and RUNCHU ZHANG2

1Department of Statistics and Actuarial Science, University of Waterloo Waterloo, Ontario, Canada N2L 3G1
2Department of Mathematics, Nankai University Tianjin, China 300071

For optimal assignment of factors to columns of a 4m2n design, we consider extensions of the minimum aberration criterion for the 2-level designs. Minimum aberration 4l2n and 422n designs in 16 and 32 runs are obtained and tabulated. Some results on the wordlength patterns and design classification are obtained.

Key Words: Defining contrasts group • Grouping • Method of replacement • Resolution


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